Terrible company culture and work enviroment, Terrible Management.
Company propaganda: Rockwell Collins is about Integrity and goes by the book on principles.
Fact: I discovered that for people that are connected inside the old boys/gals circle, Integrity and ethics are mere convenience. They can juggle and flip it any way they want to suit their own agendas.Key people including people in Management, HR and Ombudsman are involved in behaviors that Rockwell should not be proud of. In addition, what I see from other bloggers and what I heard and saw inside the company is not encouraging.
Myth: In Rockwell Collins teams work by sharing, inclusion and collaboration and keep things transparent to all employees. All employees have free and fair opportunity. Very high talent.
Fact: Engineering Leaders buy into rumors or maybe even create them. Rumors are rampant and generated particularly about employees that have innate curiosity and desire to do better and grow, but also bring expertise from elsewhere in the industry. Intellectual dishonesty is rampant among the old boys/gals Rockwell network. Verbal slurs are used if necessary to bully people. Innovation, product quality, product development cost, culture and professionalism are victims along with the bullied target.
Fact: Average talent base at Rockwell. Lot of people coasting along with no incentive to do real and great technical work, and many are doing work without trying to change the status quo. If anyone new comes along that have differing views, then just squash them. Paper pushers thrive. Crony behavior is rampant. Outsourcing to Asia, steep growth and density of foreign workers in Cedar Rapids as a proxy for competent leadership. Rockwell does not have it in its DNA to create a strong global culture either. Foreign workers have complaints about Rockwell as well.
Advice to management
This is the lousiest set of management competencies assembled in one place that I have seen.
Bring in decisive leadership and promote people who can execute with the right mindset.